Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.
Abadi,Z , Sangpour,P and Tajabadi,F . (2015). Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique. Advanced Ceramics Progress, 1(2), 6-10. doi: 10.30501/acp.2015.70004
MLA
Abadi,Z , , Sangpour,P , and Tajabadi,F . "Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique", Advanced Ceramics Progress, 1, 2, 2015, 6-10. doi: 10.30501/acp.2015.70004
HARVARD
Abadi Z, Sangpour P, Tajabadi F. (2015). 'Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique', Advanced Ceramics Progress, 1(2), pp. 6-10. doi: 10.30501/acp.2015.70004
CHICAGO
Z Abadi, P Sangpour and F Tajabadi, "Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique," Advanced Ceramics Progress, 1 2 (2015): 6-10, doi: 10.30501/acp.2015.70004
VANCOUVER
Abadi Z, Sangpour P, Tajabadi F. Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique. ACERP. 2015;1(2):6-10. doi: 10.30501/acp.2015.70004
