Optimization of Heat Treatment Cycles in Sub-atmospheric LiF-NaF-KF Based Fluoride Ion Cleaning for Removing Oxide Layers in Cracks of IN738-LC

Document Type : Original Research Article

Authors

1 Department of Ceramics, Materials and Energy Research Center (MERC), Meshkindasht, Alborz, Iran

2 Department of Semiconductors, Materials and Energy Research Center (MERC), Meshkin Dasht, Alborz, Iran

3 Department of Materials Engineering, Bu-Ali Sina University, Hamedan, Hamedan, Iran

Abstract

An improved Fluoride Ion Cleaning (FIC) process required for removing all oxide layers by a molten mixture of alkaline fluoride salts under sub-atmospheric pressure was developed and applied to oxide layers on the cracks formed on the surface of Inconel 738-LC samples. This method is directly characterized by filling up the cracks with a molten mixture of alkaline fluoride salts (LiF-NaF-KF) overheated under sub-atmospheric pressure and subsequently, by injecting hot hydrogen gas into the process chamber. The effect of cleaning time on the microstructure of the finished surface was studied in time durations up to 120 min in intervals of 30 min using cross-sectional micrographs and elemental distribution maps. In accordance with the amount of mass loss and microstructural studies during the cleaning process, the optimum cleaning time was suggested to be 90-120 min. Perquisite microstructural outcome shows that in the suggested cleaning condition, all oxide scales in the cracks would be removed without any extra damage to the gamma prime depleted layer, which is a necessary layer for preventing sample oxidation before repair. In this regard, subsequent brazing operations need an oxide-free surface.

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References

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History

  • Receive Date: 04 November 2020
  • Revise Date: 07 December 2020
  • Accept Date: 13 December 2020

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