Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique

Authors

1 Nano-Techology and Advanced, Material and energy research center

2 Nano-Techology and Advanced Materials, Material and Energy Research Center (MERC)

3 Nanomaterials and Advanced Materials, Institute of materials and energy

Abstract

Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.

Keywords